Invention Grant
- Patent Title: Microfeature workpieces and methods for forming interconnects in microfeature workpieces
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Application No.: US16991965Application Date: 2020-08-12
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Publication No.: US11476160B2Publication Date: 2022-10-18
- Inventor: William M. Hiatt , Ross S. Dando
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L23/48 ; H01L23/498 ; H01L23/538

Abstract:
Methods for forming interconnects in microfeature workpieces, and microfeature workpieces having such interconnects are disclosed herein. The microfeature workpieces may have a terminal and a substrate with a first side carrying the terminal and a second side opposite the first side. In one embodiment, a method includes (a) constructing an electrically conductive interconnect extending from the terminal to at least an intermediate depth in the substrate with the interconnect electrically connected to the terminal, and (b) removing material from the second side of the substrate so that a portion of the interconnect projects from the substrate.
Public/Granted literature
- US20210005514A1 MICROFEATURE WORKPIECES AND METHODS FOR FORMING INTERCONNECTS IN MICROFEATURE WORKPIECES Public/Granted day:2021-01-07
Information query
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