Invention Grant
- Patent Title: Deposited material structure with integrated component
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Application No.: US16688824Application Date: 2019-11-19
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Publication No.: US11479861B2Publication Date: 2022-10-25
- Inventor: Gary D. Roberge , William J. Brindley
- Applicant: UNITED TECHNOLOGIES CORPORATION
- Applicant Address: US CT Farmington
- Assignee: UNITED TECHNOLOGIES CORPORATION
- Current Assignee: UNITED TECHNOLOGIES CORPORATION
- Current Assignee Address: US CT Farmington
- Agency: Snell & Wilmer L.L.P.
- Main IPC: C23C24/04
- IPC: C23C24/04 ; B33Y80/00 ; B22F7/08 ; B22F3/24 ; B22F5/00 ; B22F5/04 ; F01D25/00 ; B22F3/02

Abstract:
A method for forming a metallic structure having a secondary component includes positioning the secondary component on a main formation surface of a main tool, the main formation surface corresponding to a desired shape of a first layer of material. The method also includes depositing a layer of material on the secondary component and the main formation surface using a cold-spray technique such that the layer of material bonds to the secondary component. The method also includes removing the layer of material and the secondary component to form the metallic structure.
Public/Granted literature
- US20200087793A1 DEPOSITED MATERIAL STRUCTURE WITH INTEGRATED COMPONENT Public/Granted day:2020-03-19
Information query
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