Invention Grant
- Patent Title: Normal incidence ellipsometer and method for measuring optical properties of sample by using same
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Application No.: US17256966Application Date: 2019-07-03
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Publication No.: US11493433B2Publication Date: 2022-11-08
- Inventor: Yong Jai Cho , Won Chegal , Hyun Mo Cho
- Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
- Applicant Address: KR Daejeon
- Assignee: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
- Current Assignee: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
- Current Assignee Address: KR Daejeon
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: KR10-2018-0081169 20180712
- International Application: PCT/KR2019/008147 WO 20190703
- International Announcement: WO2020/013517 WO 20200116
- Main IPC: G01N21/21
- IPC: G01N21/21 ; G01B11/27 ; G01N21/13
Abstract:
The present invention relates to a normal incidence ellipsometer and a method for measuring the optical properties of a sample by using same. The purpose of the present invention is to provide: a normal incidence ellipsometer in which a wavelength-dependent compensator is replaced with a wavelength-independent linear polarizer such that equipment calibration procedures are simplified while a measurement wavelength range expansion can be easily implemented; and a method for measuring the optical properties of a sample by using same.
Public/Granted literature
- US20210181090A1 NORMAL INCIDENCE ELLIPSOMETER AND METHOD FOR MEASURING OPTICAL PROPERTIES OF SAMPLE BY USING SAME Public/Granted day:2021-06-17
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