- 专利标题： Uniformity control for radio frequency plasma processing systems
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申请号： US17145190申请日： 2021-01-08
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公开(公告)号： US11521832B2公开(公告)日： 2022-12-06
- 发明人: Stephen E. Savas , Alexandre De Chambrier
- 申请人： COMET TECHNOLOGIES USA, INC.
- 申请人地址： US CA San Jose
- 专利权人： COMET TECHNOLOGIES USA, INC.
- 当前专利权人： COMET TECHNOLOGIES USA, INC.
- 当前专利权人地址： US CA San Jose
- 代理机构： Nolte Lackenbach Siegel
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; H01J37/20 ; H01J37/244
摘要：
A radio frequency plasma processing system including a reaction chamber, a pedestal disposed in the reaction chamber, and a plurality of sector plates disposed azimuthally around the pedestal in an annulus between the pedestal and the reaction chamber.
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