Invention Grant
- Patent Title: Multi-protrusion transfer gate structure
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Application No.: US16850524Application Date: 2020-04-16
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Publication No.: US11521997B2Publication Date: 2022-12-06
- Inventor: Kun-Huei Lin , Yun-Wei Cheng , Chun-Hao Chou , Kuo-Cheng Lee , Chun-Wei Chia
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H04N5/335 ; H01L29/423

Abstract:
An IC structure includes a substrate region having a first doping type and including an upper surface, first and second regions within the substrate region, each of the first and second regions having a second doping type opposite the first doping type, and a gate conductor including a plurality of conductive protrusions extending into the substrate region in a direction perpendicular to a plane of the upper surface. The conductive protrusions are electrically connected to each other, and at least a portion of each conductive protrusion is positioned between the first and second regions.
Public/Granted literature
- US20210327947A1 INTEGRATED CIRCUIT STRUCTURE, DEVICE, AND METHOD Public/Granted day:2021-10-21
Information query
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