Invention Grant
- Patent Title: Process margin relaxation
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Application No.: US17305287Application Date: 2021-07-02
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Publication No.: US11523192B2Publication Date: 2022-12-06
- Inventor: Tao Ling , Ravi S. Tummidi , Yi Ho Lee , Mark A. Webster
- Applicant: Cisco Technology, Inc.
- Applicant Address: US CA San Jose
- Assignee: Cisco Technology, Inc.
- Current Assignee: Cisco Technology, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Patterson + Sheridan, LLP
- Main IPC: H04J14/00
- IPC: H04J14/00 ; H04Q11/00 ; H04J14/02

Abstract:
Process margin relaxation is provided in relation to a compensated-for process via a first optical device, fabricated to satisfy an operational specification when a compensated-for process is within a first tolerance range; a second optical device, fabricated to satisfy the operational specification when the compensated-for process is within second tolerance range, different than the first tolerance range; a first optical switch connected to an input and configured to output an optical signal received from the input to one of the first optical device and the second optical device; and a second optical switch configured to combine outputs from the first optical device and the second optical device.
Public/Granted literature
- US20210345022A1 PROCESS MARGIN RELAXATION Public/Granted day:2021-11-04
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