Invention Grant
- Patent Title: Lithographic apparatus, metrology apparatus, optical system and method
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Application No.: US17438328Application Date: 2020-02-28
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Publication No.: US11537055B2Publication Date: 2022-12-27
- Inventor: Stanislav Smirnov
- Applicant: ASML Holding N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2020/055227 WO 20200228
- International Announcement: WO2020/182488 WO 20200917
- Main IPC: G03F9/00
- IPC: G03F9/00

Abstract:
A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element and directing the beam, via an optical system, to a first reflective element at a first angle of incidence. The beam has a first polarization and a second polarization that is perpendicular to the first polarization. The first reflective element reflects the beam toward a second reflective element at a second angle of incidence causing the beam to impinge on the substrate. The first and second angles of incidence are selected to reduce variations of a ratio of intensities of the first polarization to the second polarization of the beam imparted by a property of a layer of at least one of the first and second reflective elements.
Public/Granted literature
- US20220179330A1 LITHOGRAPHIC APPARATUS, METROLOGY APPARATUS, OPTICAL SYSTEM AND METHOD Public/Granted day:2022-06-09
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