Invention Grant
- Patent Title: Photo sensor having a photosensitive layer made of intrinsic amorphous silicon, manufacturing method thereof, and display panel having the same
-
Application No.: US16956962Application Date: 2020-04-02
-
Publication No.: US11557145B2Publication Date: 2023-01-17
- Inventor: Juncheng Xiao , Fei Ai , Jiyue Song
- Applicant: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Hubei
- Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Hubei
- Priority: CN202010190030.9 20200318
- International Application: PCT/CN2020/083006 WO 20200402
- International Announcement: WO2021/184430 WO 20210923
- Main IPC: G06V40/13
- IPC: G06V40/13 ; H01L27/146

Abstract:
A photo sensor, a manufacturing method thereof, and a display panel are disclosed. By an ion implantation method forming an N-type region and a P-type region on a surface of polycrystalline silicon in a same layer respectively, compatibility with an ion implantation process is ensured, while covering a layer of an amorphous silicon photosensitive layer on the polycrystalline silicon enhances light absorption ability and can increase photo-generated electron-hole pairs. Furthermore, built-in electric fields exist on a horizontal direction and a vertical direction, which can more effectively separate the electron-hole pairs to enhance photo-generated electric current to improve accuracy of fingerprint recognition.
Public/Granted literature
- US20220122370A1 PHOTO SENSOR, MANUFACTURING METHOD THEREOF, AND DISPLAY PANEL Public/Granted day:2022-04-21
Information query