Invention Grant
- Patent Title: Semiconductor device having improved margins
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Application No.: US16837101Application Date: 2020-04-01
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Publication No.: US11557582B2Publication Date: 2023-01-17
- Inventor: Jeong-Lim Kim , Myung Soo Noh , No Young Chung , Seok Yun Jeong , Young Han Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2019-0108535 20190903
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L27/092 ; G06F30/392 ; H01L27/11 ; G06F117/12

Abstract:
A semiconductor device comprising first and second unit cells, the first unit cell comprising a first fin pattern extending in a first direction, a first gate pattern extending in a second direction, and a first contact disposed on a side of the first gate pattern contacting the first fin pattern, the second unit cell comprising a second fin pattern extending in the first direction, a second gate pattern extending in the second direction, and a second contact disposed on a side of the second gate pattern contacting the second fin pattern, wherein the first and second gate patterns are spaced apart and lie on a first straight line extending in the second direction, the first and second contacts are spaced apart and lie on a second straight line extending in the second direction, and a first middle contact is disposed on and connects the first and second contacts.
Public/Granted literature
- US20210066283A1 SEMICONDUCTOR DEVICE AND LAYOUT DESIGN METHOD Public/Granted day:2021-03-04
Information query
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