Invention Grant
- Patent Title: Schottky barrier diode
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Application No.: US17282610Application Date: 2019-10-09
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Publication No.: US11557681B2Publication Date: 2023-01-17
- Inventor: Jun Arima , Minoru Fujita , Jun Hirabayashi , Kohei Sasaki
- Applicant: TDK Corporation , TAMURA CORPORATION , Novel Crystal Technology, Inc.
- Applicant Address: JP Tokyo; JP Tokyo; JP Saitama
- Assignee: TDK Corporation,TAMURA CORPORATION,Novel Crystal Technology, Inc.
- Current Assignee: TDK Corporation,TAMURA CORPORATION,Novel Crystal Technology, Inc.
- Current Assignee Address: JP Tokyo; JP Tokyo; JP Saitama
- Agency: McDermott Will & Emery LLP
- Priority: JPJP2018-199202 20181023
- International Application: PCT/JP2019/039853 WO 20191009
- International Announcement: WO2020/085094 WO 20200430
- Main IPC: H01L29/872
- IPC: H01L29/872 ; H01L29/47

Abstract:
An object of the present invention is to provide a Schottky barrier diode less liable to cause dielectric breakdown due to concentration of an electric field. A Schottky barrier diode according to this disclosure includes a semiconductor substrate made of gallium oxide, a drift layer made of gallium oxide and provided on the semiconductor substrate, an anode electrode brought into Schottky contact with the drift layer, and a cathode electrode brought into ohmic contact with the semiconductor substrate. The drift layer has an outer peripheral trench surrounding the anode electrode in a plan view. The surface of the drift layer positioned between the anode electrode and the outer peripheral trench is covered with a semiconductor layer having a conductivity type opposite to that of the drift layer.
Public/Granted literature
- US20210343879A1 SCHOTTKY BARRIER DIODE Public/Granted day:2021-11-04
Information query
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