发明授权
- 专利标题: Polarized light irradiation apparatus and method for polarized light irradiation
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申请号: US17125216申请日: 2020-12-17
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公开(公告)号: US11573429B2公开(公告)日: 2023-02-07
- 发明人: Kazumasa Ishii
- 申请人: Ushio Denki Kabushiki Kaisha
- 申请人地址: JP Tokyo
- 专利权人: Ushio Denki Kabushiki Kaisha
- 当前专利权人: Ushio Denki Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Studebaker & Brackett PC
- 优先权: JPJP2019-232588 20191224
- 主分类号: G02B27/28
- IPC分类号: G02B27/28 ; G02F1/13 ; G02F1/1337
摘要:
A polarized light irradiation apparatus includes: a light source unit including a light source, and emitting parallel light derived from the light source; a polarizing plate for polarizing the parallel light emitted from the light source unit to output polarized light; a polarizing plate holder for holding the polarizing plate; a mask holder for holding a mask having a light transmissive part and a light shielding part; a work stage for holding a work that is irradiated with light that has been polarized by the polarizing plate and has passed the mask; a polarization direction changer for changing a direction of a polarization axis of light for irradiating the work held by the work stage; and an irradiation location changer for changing a location of the polarized light that irradiates the work.
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