Invention Grant
- Patent Title: High-voltage capacitor, system including the capacitor and method for manufacturing the capacitor
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Application No.: US17170550Application Date: 2021-02-08
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Publication No.: US11574996B2Publication Date: 2023-02-07
- Inventor: Davide Giuseppe Patti , Giuseppina Valvo , DelfoNunziato Sanfilippo
- Applicant: STMICROELECTRONICS S.R.L.
- Applicant Address: IT Agrate Brianza
- Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee Address: IT Agrate Brianza
- Agency: Seed Intellectual Property Law Group LLP
- Priority: IT102017000108913 20170928,IT102017000108918 20170928
- Main IPC: H01L49/02
- IPC: H01L49/02 ; H01L23/522

Abstract:
In various embodiments, the present disclosure provides capacitors and methods of forming capacitors. In one embodiment, a capacitor includes a substrate, a first electrode on the substrate, a second electrode, and a first dielectric layer. A portion of the first electrode is exposed in a contact region. The first dielectric layer includes a first dielectric region between the first electrode and the second electrode, and a second dielectric region between the first dielectric region and the contact region. The second dielectric region is contiguous to the first dielectric region, and a surface of the second dielectric region defines a surface path between the first electrode and the contact region. The second dielectric region has a plurality of grooves that increase a spatial extension of said surface path.
Public/Granted literature
- US20210159309A1 HIGH-VOLTAGE CAPACITOR, SYSTEM INCLUDING THE CAPACITOR AND METHOD FOR MANUFACTURING THE CAPACITOR Public/Granted day:2021-05-27
Information query
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