Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17143224Application Date: 2021-01-07
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Publication No.: US11587897B2Publication Date: 2023-02-21
- Inventor: Joongwon Shin , Yeonjin Lee , Inyoung Lee , Jimin Choi , Jung-Hoon Han
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2020-0037698 20200327,KR10-2020-0080050 20200630
- Main IPC: H01L23/29
- IPC: H01L23/29 ; H01L23/31 ; H01L23/00

Abstract:
Disclosed is a semiconductor device comprising a semiconductor substrate, a conductive pad on a first surface of the semiconductor substrate, a passivation layer on the first surface of the semiconductor substrate, the passivation layer having a first opening that exposes the conductive pad, an organic dielectric layer on the passivation layer, the organic dielectric layer having a second opening, and a bump structure on the conductive pad and in the first and second openings. The organic dielectric layer includes a material different from a material of the passivation layer. The second opening is spatially connected to the first opening and exposes a portion of the passivation layer. The bump structure includes a pillar pattern in contact with the passivation layer and the organic dielectric layer.
Public/Granted literature
- US20210305188A1 SEMICONDUCTOR DEVICE Public/Granted day:2021-09-30
Information query
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