Invention Grant
- Patent Title: Semiconductor storage device
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Application No.: US17018682Application Date: 2020-09-11
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Publication No.: US11594543B2Publication Date: 2023-02-28
- Inventor: Yefei Han , Weili Cai , Naoya Yoshimura
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JPJP2020-051387 20200323
- Main IPC: H01L27/11556
- IPC: H01L27/11556 ; G11C5/06 ; G11C5/02 ; H01L27/11519 ; H01L27/11565 ; H01L27/11582

Abstract:
According to one embodiment, a semiconductor storage device includes a semiconductor pillar including a channel. The channel includes a first channel portion and a second channel portion. A virtual cross section intersecting a first direction and including a first interconnection, a first electrode, the semiconductor pillar, a second electrode, and a second interconnection is determined. Both first end portions of the first channel portion and a first midpoint between both the first end portions are determined in the virtual cross section. Both second end portions of the second channel portion and a second midpoint between both the second end portions are determined in the virtual cross section. In this case, an angle between a second direction and a center line connecting the first midpoint and the second midpoint is an acute angle.
Public/Granted literature
- US20210296338A1 SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2021-09-23
Information query
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