Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US17119485Application Date: 2020-12-11
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Publication No.: US11609504B2Publication Date: 2023-03-21
- Inventor: Johannes Catharinus Hubertus Mulkens , Nicolaas Ten Kate
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Valkenswaard
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Valkenswaard
- Agency: Pillsbury Winthrop Shaw Pitmann LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03B27/32
Abstract:
A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.
Public/Granted literature
- US20210096476A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2021-04-01
Information query
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