- 专利标题: 3D chip package based on through-silicon-via interconnection elevator
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申请号: US17026186申请日: 2020-09-19
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公开(公告)号: US11637056B2公开(公告)日: 2023-04-25
- 发明人: Mou-Shiung Lin , Jin-Yuan Lee
- 申请人: iCometrue Company Ltd.
- 申请人地址: TW Zhubei
- 专利权人: iCometrue Company Ltd.
- 当前专利权人: iCometrue Company Ltd.
- 当前专利权人地址: TW Zhubei
- 主分类号: H01L23/00
- IPC分类号: H01L23/00 ; H01L23/498
摘要:
A chip package includes a first interconnection scheme; a plurality of first metal contacts under and on the first interconnection scheme and at a bottom surface of the chip package; a first semiconductor IC chip over the first interconnection scheme; a first connector over the first interconnection scheme and at a same horizontal level as the first semiconductor IC chip, wherein the first connector comprises a first substrate and a plurality of first through vias vertically extending through the first substrate of the first connector; a first polymer layer over the first interconnection scheme, wherein the first polymer layer has a top surface coplanar with a top surface of the first semiconductor IC chip, a top surface of the first substrate of the first connector and a top surface of each of the plurality of first through vias; and a second interconnection scheme on the top surface of the first polymer layer, the top surface of the first semiconductor IC chip, the top surface of the first connector and the top surface of each of the plurality of first through vias, wherein the second interconnection scheme comprises a plurality of second metal contacts at a top surface of the chip package.
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