Invention Grant
- Patent Title: Apparatuses including conductive structure layouts
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Application No.: US17301758Application Date: 2021-04-13
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Publication No.: US11646271B2Publication Date: 2023-05-09
- Inventor: Hirokazu Matsumoto , Ryota Suzuki , Mitsuki Koda , Makoto Sato
- Applicant: MICRON TECHNOLOGY, INC.
- Applicant Address: US ID Boise
- Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee Address: US ID Boise
- Agency: Dorsey & Whitney LLP
- The original application number of the division: US16590571 2019.10.02
- Main IPC: H01L23/538
- IPC: H01L23/538 ; H01L25/18 ; H01L25/065 ; H01L21/768

Abstract:
Embodiments of the disclosure are drawn to arrangements of one or more “cuts” or pattern of cuts in conductive structures. Wiring layers may each include a cut pattern including a set of cuts through conductive structures of the wiring layers where each of the cuts is offset from the other in a direction orthogonal to the cut. The cut pattern in a wiring layer may be orthogonal to the cut pattern in another wiring layer. In some examples, the cut pattern may be a stair-step pattern. In some examples, the cut pattern may be interrupted by other conductive structures.
Public/Granted literature
- US20210233858A1 APPARATUSES INCLUDING CONDUCTIVE STRUCTURE LAYOUTS Public/Granted day:2021-07-29
Information query
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