- 专利标题: Contact structure and electronic device having the same
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申请号: US17215450申请日: 2021-03-29
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公开(公告)号: US11652052B2公开(公告)日: 2023-05-16
- 发明人: Xi-Zhao Wang , Yi-Min Jiang , Li-Wei Mu , Shan-Yu Wu , Chao-Hui Kuo , Can-Liang Zhao , Hong-Yan Lian , Chun-Wei Liu
- 申请人: TPK Advanced Solutions Inc.
- 申请人地址: CN Fujian
- 专利权人: TPK Advanced Solutions Inc.
- 当前专利权人: TPK Advanced Solutions Inc.
- 当前专利权人地址: CN Fujian
- 代理机构: Cooper Legal Group, LLC
- 主分类号: H01L23/532
- IPC分类号: H01L23/532 ; G06F3/041 ; G06F3/044 ; H01L31/18
摘要:
The present disclosure provides a contact structure and an electronic device having the same. The contact structure includes a substrate, a copper layer, an organic composite protective layer, and a silver nanowire layer. The copper layer is disposed on the substrate. The nanowire-distribution-promotion layer is disposed between the copper layer and the silver nanowire layer.
公开/授权文献
- US20220308727A1 CONTACT STRUCTURE AND ELECTRONIC DEVICE HAVING THE SAME 公开/授权日:2022-09-29
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