Invention Grant
- Patent Title: Contacts and method of manufacturing the same
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Application No.: US17235950Application Date: 2021-04-21
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Publication No.: US11653491B2Publication Date: 2023-05-16
- Inventor: Feng-Yi Chang , Fu-Che Lee
- Applicant: UNITED MICROELECTRONICS CORP. , Fujian Jinhua Integrated Circuit Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.,Fujian Jinhua Integrated Circuit Co., Ltd.
- Current Assignee: UNITED MICROELECTRONICS CORP.,Fujian Jinhua Integrated Circuit Co., Ltd.
- Current Assignee Address: TW Hsin-Chu; CN Quanzhou
- Agent Winston Hsu
- Priority: CN 1710669727.2 2017.08.08
- The original application number of the division: US16011652 2018.06.19
- Main IPC: H10B12/00
- IPC: H10B12/00

Abstract:
A method of manufacturing contacts is provided in the present invention, which include the steps of forming a plurality of mask bars on a substrate, forming a circular mask surrounding each mask bar, wherein the circular masks connect each other and define a plurality of opening patterns collectively with the mask bars, using the mask bars and the circular masks as etch masks to perform an etch process and to transfer the opening patterns and form a plurality recesses in the substrate, and filling up the recesses with metal to form contacts.
Public/Granted literature
- US20210242214A1 CONTACTS AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2021-08-05
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