Invention Grant
- Patent Title: EUV pellicle with structured ventilation frame
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Application No.: US17119668Application Date: 2020-12-11
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Publication No.: US11662661B2Publication Date: 2023-05-30
- Inventor: Yun-Yue Lin
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McDermott Will & Emery LLP
- Main IPC: G03F1/64
- IPC: G03F1/64 ; G03F7/20

Abstract:
A reticle structure includes a reticle having patterned features and a first border section enclosing the patterned features. The reticle structure includes a membrane having a middle section a second border section enclosing the middle section. The reticle structure includes a frame disposed between the membrane and the reticle to mount the membrane over the patterned features of the reticle. The frame creates an enclosure between the reticle and the membrane and encircles the patterned features of the reticle. The frame includes a plurality of holes and the plurality of holes produces a threshold percentage of opening in the frame to maintain an equalized pressure difference between the enclosure and outside the enclosure below a threshold pressure.
Public/Granted literature
- US20210240071A1 EUV PELLICLE WITH STRUCTURED VENTILATION FRAME Public/Granted day:2021-08-05
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