Invention Grant
- Patent Title: Hollow waveguide assembly formed by affixing first and second substrates to form a cavity therein and having a conductive layer covering the cavity
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Application No.: US17106269Application Date: 2020-11-30
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Publication No.: US11664567B2Publication Date: 2023-05-30
- Inventor: Adrianus Buijsman , Abdellatif Zanati , Giorgio Carluccio
- Applicant: NXP B.V.
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Main IPC: H01P3/12
- IPC: H01P3/12 ; H01P11/00 ; H01L23/66 ; H01P5/107 ; H01Q1/32 ; H01Q1/38 ; H05K3/46

Abstract:
A method of manufacturing a device is provided. The method includes forming a first cavity in a first substrate with the first cavity having a first depth. A second cavity is formed in a second substrate with the second cavity having a second depth. The first cavity and the second cavity are aligned with each other. The first substrate is affixed to the second substrate to form a waveguide substrate having a hollow waveguide with a first dimension substantially equal to the first depth plus the second depth. A conductive layer is formed on the sidewalls of the hollow waveguide. The waveguide substrate is placed over a packaged semiconductor device, the hollow waveguide aligned with a launcher of the packaged semiconductor device.
Public/Granted literature
- US20220173490A1 SEMICONDUCTOR DEVICE WITH SUBSTRATE INTEGRATED HOLLOW WAVEGUIDE AND METHOD THEREFOR Public/Granted day:2022-06-02
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