Invention Grant
- Patent Title: Leveling system for lift device
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Application No.: US17464897Application Date: 2021-09-02
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Publication No.: US11679967B2Publication Date: 2023-06-20
- Inventor: JiHong Hao , Ignacy Puszkiewicz
- Applicant: Oshkosh Corporation
- Applicant Address: US WI Oshkosh
- Assignee: Oshkosh Corporation
- Current Assignee: Oshkosh Corporation
- Current Assignee Address: US WI Oshkosh
- Agency: Foley & Lardner LLP
- Main IPC: B66F9/00
- IPC: B66F9/00 ; B66C9/00 ; B66F9/075 ; B66F11/04 ; B60G17/016 ; B66F5/04 ; B66F9/065 ; E01B27/17 ; B66F17/00 ; B60G9/02 ; B60P1/34 ; B66F13/00 ; B60G21/00 ; E02F9/02 ; B66C23/00 ; B60P3/12

Abstract:
A lift machine includes a base having a first end and a second end, a first assembly, and a second assembly. The first end has first and second pivot points defining a first lateral axis. The second end has third and fourth pivot points defining a second lateral axis. The first assembly is pivotably coupled to the first and second pivot points. The first assembly extends away from the base in a first direction such that first and second tractive elements are longitudinally offset from the first lateral axis and spaced from the first end of the base. The second assembly is pivotably coupled to the third and fourth pivot points. The second assembly extends away from the base in a second direction such that third and fourth tractive elements are longitudinally offset from the second lateral axis and spaced from the second end of the base.
Public/Granted literature
- US20210395058A1 LEVELING SYSTEM FOR LIFT DEVICE Public/Granted day:2021-12-23
Information query
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