Invention Grant
- Patent Title: Magnetic field driven liquid crystal patterning control system
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Application No.: US17671449Application Date: 2022-02-14
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Publication No.: US11681194B2Publication Date: 2023-06-20
- Inventor: Erik Shipton , Oleg Yaroshchuk
- Applicant: META PLATFORMS TECHNOLOGIES, LLC
- Applicant Address: US CA Menlo Park
- Assignee: META PLATFORMS TECHNOLOGIES, LLC
- Current Assignee: META PLATFORMS TECHNOLOGIES, LLC
- Current Assignee Address: US CA Menlo Park
- Agency: Artegis Law Group, LLP
- Main IPC: G02F1/137
- IPC: G02F1/137 ; G02B27/01 ; G02F1/1337

Abstract:
Various embodiments set forth liquid crystal (LC) patterning control systems in which LCs are aligned using locally applied magnetic fields. The index of refraction experienced by light propagating through an anisotropic LC is dependent on orientation. As a result, a phase difference may be imparted to an optical beam that is passed through, or reflected from, an array of LCs whose orientations are controlled via locally applied magnetic fields. In some embodiments, the locally applied magnetic fields may be generated by driving currents through wires that intersect at micro or nanomagnetic particles or at magnetic domains, or by applying voltages to micro or nanocoils wrapped around high-permeability cores, among other things.
Public/Granted literature
- US20220171232A1 MAGNETIC FIELD DRIVEN LIQUID CRYSTAL PATTERNING CONTROL SYSTEM Public/Granted day:2022-06-02
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