Invention Grant
- Patent Title: Method of manufacturing variable resistance memory device
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Application No.: US17339297Application Date: 2021-06-04
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Publication No.: US11683940B2Publication Date: 2023-06-20
- Inventor: Dongkyu Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Lee IP Law, P.C.
- Priority: KR 20190037384 2019.03.29
- The original application number of the division: US16587250 2019.09.30
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L45/00

Abstract:
A variable resistance memory device and a method of manufacturing the same, the variable resistance memory device including a substrate including a first memory region and a second memory region; a plurality of first memory cells on the first memory region; and a plurality of second memory cells on the second memory region, wherein each of the first memory cells includes a first resistance element and a selection element, each of the second memory cells includes a second resistance element, and a maximum value of a variable resistance of the second resistance element is less than a maximum value of a variable resistance of the first resistance element.
Public/Granted literature
- US20210296399A1 METHOD OF MANUFACTURING VARIABLE RESISTANCE MEMORY DEVICE Public/Granted day:2021-09-23
Information query
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