Invention Grant
- Patent Title: Encapsulated cleanroom system
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Application No.: US17210361Application Date: 2021-03-23
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Publication No.: US11686479B2Publication Date: 2023-06-27
- Inventor: Shiro Hara , Hitoshi Maekawa , Sommawan Khumpuang , Takashi Yajima , Yuuki Ishida
- Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Applicant Address: JP Tokyo
- Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Tokyo
- Agency: Law Office of Katsuhiro Arai
- Priority: JP 2020057088 2020.03.27
- Main IPC: F24F3/167
- IPC: F24F3/167 ; F24F3/04 ; F24F11/49 ; F24F11/74 ; F24F110/30 ; F24F110/40

Abstract:
An encapsulated cleanroom system comprising a processing chamber and a storage section in which the processing chamber is stored, wherein, during operation, the pressure in the storage section is lower or higher than the pressures in the processing chamber and exterior space. The system can simultaneously prevent the entry of outside gases into its processing chamber and the leakage of the gases inside the processing chamber to the exterior space.
Public/Granted literature
- US20210302034A1 ENCAPSULATED CLEANROOM SYSTEM Public/Granted day:2021-09-30
Information query
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