- 专利标题: Semiconductor device
-
申请号: US17202542申请日: 2021-03-16
-
公开(公告)号: US11688658B2公开(公告)日: 2023-06-27
- 发明人: Hyunsuk Chun , Shams U. Arifeen , Chan H. Yoo , Tracy N. Tennant
- 申请人: Micron Technology, Inc.
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Brooks, Cameron & Huebsch, PLLC
- 分案原申请号: US15683059 2017.08.22
- 主分类号: H01L21/48
- IPC分类号: H01L21/48 ; H01L23/31 ; H01L23/498 ; H01L21/683 ; H01L21/56
摘要:
A semiconductor device having a semiconductor die, a redistribution layer (RDL), and an encapsulant. The RDL layer can be formed on a first surface of the semiconductor die. The encapsulant can enclose a second surface and side surfaces of the semiconductor die. The encapsulant can enclose side portions of the RDL.
公开/授权文献
- US20210202337A1 SEMICONDUCTOR DEVICE 公开/授权日:2021-07-01
信息查询
IPC分类: