- 专利标题: Semiconductor devices having an electro-static discharge protection structure
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申请号: US16945988申请日: 2020-08-03
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公开(公告)号: US11688701B2公开(公告)日: 2023-06-27
- 发明人: Yi-Feng Chang
- 申请人: Taiwan Semiconductor Manufacturing Company Limited
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company Limited
- 当前专利权人: Taiwan Semiconductor Manufacturing Company Limited
- 当前专利权人地址: TW Hsinchu
- 代理机构: Jones Day
- 分案原申请号: US14609498 2015.01.30
- 主分类号: H01L23/60
- IPC分类号: H01L23/60 ; H01L23/482 ; H01L23/522 ; H01L27/02 ; H01L21/02
摘要:
A semiconductor device includes a substrate and a metallization layer. The substrate has an active region that includes opposite first and second edges. The metallization layer is disposed above the substrate, and includes a pair of metal lines and a metal plate. The metal lines extend from an outer periphery of the active region into the active region and toward the second edge of the active region. The metal plate interconnects the metal lines and at least a portion of which is disposed at the outer periphery of the active region.
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