Invention Grant
- Patent Title: Auto-focusing device and method of fabricating the same
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Application No.: US16850867Application Date: 2020-04-16
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Publication No.: US11693295B2Publication Date: 2023-07-04
- Inventor: Ting-Jung Chen , Shih-Wei Lin
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: G03B13/36
- IPC: G03B13/36 ; G02B7/09 ; H04N23/67 ; H10N30/03 ; H10N30/07 ; H10N30/01

Abstract:
In accordance with some embodiments, a method of forming an auto-focusing device is provided. The method includes forming a cantilever beam member. The cantilever beam member has a ring shape. The method further includes forming a piezoelectric member over the cantilever beam member. The method also includes forming a membrane over the cantilever beam member. The membrane has a first region and a second region. The first region has a planar surface, and the second region is located between the first region and an inner edge of the cantilever beam member and has a plurality of corrugation structures. In addition, the method includes applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer.
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