Invention Grant
- Patent Title: Quantum dot devices with multiple layers of gate metal
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Application No.: US16365018Application Date: 2019-03-26
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Publication No.: US11699747B2Publication Date: 2023-07-11
- Inventor: Hubert C. George , Sarah Atanasov , Ravi Pillarisetty , Lester Lampert , James S. Clarke , Nicole K. Thomas , Roman Caudillo , Kanwaljit Singh , David J. Michalak , Jeanette M. Roberts , Stephanie A. Bojarski
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Akona IP
- Main IPC: H01L29/423
- IPC: H01L29/423 ; G06N10/00 ; H01L29/66 ; H01L29/78 ; H01L29/40 ; H01L29/76 ; B82Y10/00 ; H01L29/775

Abstract:
Disclosed herein are quantum dot devices with multiple layers of gate metal, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a quantum well stack; an insulating material above the quantum well stack, wherein the insulating material includes a trench; and a gate on the insulating material and extending into the trench, wherein the gate includes a first gate metal in the trench and a second gate metal above the first gate metal.
Public/Granted literature
- US20200312989A1 QUANTUM DOT DEVICES WITH MULTIPLE LAYERS OF GATE METAL Public/Granted day:2020-10-01
Information query
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