- 专利标题： Plasma probe device, plasma processing apparatus, and control method
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申请号： US17006201申请日： 2020-08-28
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公开(公告)号： US11705310B2公开(公告)日： 2023-07-18
- 发明人: Taro Ikeda , Mikio Sato , Eiki Kamata
- 申请人： TOYO ELECTRON LIMITED
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 代理机构： Nath, Goldberg & Meyer
- 代理商 Jerald L. Meyer; Tanya E. Harkins
- 优先权： JP 19162336 2019.09.05
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; G01R1/07
摘要：
A plasma probe device includes: an antenna installed in an opening portion formed in a wall of a processing container via a seal member that seals between a vacuum space and an atmospheric space; and a light transmission portion installed inside the antenna or forming at least a portion of the antenna, and configured to transmit emission of plasma generated in the vacuum space to the atmospheric space.
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