Invention Grant
- Patent Title: Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
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Application No.: US17460947Application Date: 2021-08-30
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Publication No.: US11709436B2Publication Date: 2023-07-25
- Inventor: Patricius Aloysius Jacobus Tinnemans , Patrick Warnaar , Vasco Tomas Tenner , Maurits Van Der Schaar
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP 186825 2018.08.01 EP 199813 2018.10.11
- Main IPC: G01R31/265
- IPC: G01R31/265

Abstract:
Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.
Public/Granted literature
- US20210389365A1 METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE OR MORE STRUCTURES ON A SUBSTRATE Public/Granted day:2021-12-16
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