Electric field shaping apparatus and target processing device using electric field
Abstract:
An electric field shaping apparatus according to a present embodiment includes a substrate, a first electrode positioned on the substrate, a second electrode spaced apart from the first electrode, a power source configured to provide a voltage between the first electrode and the second electrode, and an insulating material with which the first electrode is coated, wherein one or more holes configured to shape an electric field generated between the first electrode and the second electrode are formed in the insulating material.
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