- 专利标题: Optically detectable reference feature for processing a semiconductor wafer
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申请号: US17126743申请日: 2020-12-18
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公开(公告)号: US11721638B2公开(公告)日: 2023-08-08
- 发明人: Oliver Blank
- 申请人: Infineon Technologies Austria AG
- 申请人地址: AT Villach
- 专利权人: Infineon Technologies Austria AG
- 当前专利权人: Infineon Technologies Austria AG
- 当前专利权人地址: AT Villach
- 代理机构: Murphy, Bilak & Homiller, PLLC
- 优先权: DE 2018103738.4 2018.02.20
- 主分类号: H01L23/544
- IPC分类号: H01L23/544 ; H01L21/66 ; H01L21/78
摘要:
A semiconductor wafer has a semiconductor body, an insulation layer on the semiconductor body, a scribeline region designated to be subjected to a wafer separation processing stage, and an optically detectable reference feature laterally spaced inward from the scribeline region and configured to serve as a reference position during the wafer separation processing stage. A corresponding method of processing the semiconductor wafer, a power semiconductor die and a semiconductor wafer separation apparatus are also described.
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