- 专利标题: Integrated circuit read only memory (ROM) structure
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申请号: US17193594申请日: 2021-03-05
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公开(公告)号: US11723194B2公开(公告)日: 2023-08-08
- 发明人: Geng-Cing Lin , Ze-Sian Lu , Meng-Sheng Chang , Chia-En Huang , Jung-Ping Yang , Yen-Huei Chen
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Hauptman Ham, LLP
- 主分类号: H01L27/112
- IPC分类号: H01L27/112 ; H10B20/00 ; H01L21/265 ; H01L23/528
摘要:
An integrated circuit read only memory (ROM) structure includes a first ROM transistor with a first gate electrode, a first source, and a first drain, and a second ROM transistor with a second gate electrode, a second source, and a second drain. A drain conductive line is over the first drain and the second drain, and is between the first drain and the second drain. The first drain, the drain conductive line and the second drain are between the first gate electrode and the second gate electrode, and a first trench isolation structure electrically isolates the first drain from the first source is below the first gate electrode.
公开/授权文献
- US20220285375A1 INTEGRATED CIRCUIT READ ONLY MEMORY (ROM) STRUCTURE 公开/授权日:2022-09-08
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