- 专利标题: Arbitrary electron dose waveforms for electron microscopy
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申请号: US17825261申请日: 2022-05-26
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公开(公告)号: US11728128B2公开(公告)日: 2023-08-15
- 发明人: Ruth Shewmon Bloom , Bryan Walter Reed , Daniel Joseph Masiel , Sang Tae Park
- 申请人: Integrated Dynamic Electron Solutions, Inc.
- 申请人地址: US CA Pleasanton
- 专利权人: INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- 当前专利权人: INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- 当前专利权人地址: US CA Pleasanton
- 代理机构: Wilson Sonsini Goodrich & Rosati
- 主分类号: H01J37/24
- IPC分类号: H01J37/24 ; H01J37/29 ; H01J37/28 ; H01J37/147
摘要:
A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.
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