- 专利标题： Semiconductor manufacturing device
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申请号： US16941661申请日： 2020-07-29
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公开(公告)号： US11728188B2公开(公告)日： 2023-08-15
- 发明人: Yuji Hashimoto , Shinsuke Muraki , Hiroaki Yamada
- 申请人： Kioxia Corporation
- 申请人地址： JP Minato-ku
- 专利权人： Kioxia Corporation
- 当前专利权人： Kioxia Corporation
- 当前专利权人地址： JP Minato-ku
- 代理机构： Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP 19153183 2019.08.23
- 主分类号： H01L21/67
- IPC分类号： H01L21/67 ; B08B3/08 ; B08B13/00 ; B08B3/10
摘要：
According to one embodiment, a semiconductor manufacturing device includes a chemical solution preparation tank configured to prepare a solution; a chamber configured to discharge the chemical solution prepared at the chemical solution preparation tank to a substrate; a pressure sensor configured to measure a pressure inside the chemical solution preparation tank; and a variable opening valve arranged between the chemical solution preparation tank and an exhaust pipe.
公开/授权文献
- US20210057241A1 SEMICONDUCTOR MANUFACTURING DEVICE 公开/授权日：2021-02-25
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