Invention Grant
- Patent Title: High registration particles-transferring system
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Application No.: US16781813Application Date: 2020-02-04
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Publication No.: US11732362B2Publication Date: 2023-08-22
- Inventor: Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
- Applicant: Xerox Corporation , Palo Alto Research Center Incorporated
- Applicant Address: US CT Norwalk
- Assignee: Xerox Corporation,Palo Alto Research Center Incorporated
- Current Assignee: Xerox Corporation,Palo Alto Research Center Incorporated
- Current Assignee Address: US CT Norwalk; US CA Palo Alto
- Agency: Womble Bond Dickinson (US) LLP
- The original application number of the division: US15591959 2017.05.10
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/67 ; B81B3/00 ; C23C16/50

Abstract:
Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.
Public/Granted literature
- US20200173026A1 HIGH REGISTRATION PARTICLES-TRANSFERRING SYSTEM Public/Granted day:2020-06-04
Information query
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