Invention Grant
- Patent Title: Gas sample introduction device, leak check method of gas sample introduction device
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Application No.: US17525221Application Date: 2021-11-12
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Publication No.: US11733228B2Publication Date: 2023-08-22
- Inventor: Kota Kamei
- Applicant: SHIMADZU CORPORATION
- Applicant Address: JP Kyoto
- Assignee: Shimadzu Corporation
- Current Assignee: Shimadzu Corporation
- Current Assignee Address: JP Kyoto
- Agency: Muir Patent Law, PLLC
- Priority: JP 20196930 2020.11.27
- Main IPC: G01N33/00
- IPC: G01N33/00 ; G01N1/22

Abstract:
A gas sample introduction device includes a sample container connection flow path, a sample loop and a first flow path switching valve, having a first state in which the pressurizing gas is supplied to the sample container connection flow path via the sample loop and a second state in which the pressurizing gas is supplied to the sample container connection flow path without via the sample loop. A leak check method includes a first determination step of determining whether or not there is a gas leak by setting the first flow path switching valve to a first state and a second determination step of identifying a location of a gas leak by performing a second determination of whether or not there is a gas leak by setting the first flow path switching valve to a second state, when there is a gas leak in the first determination step.
Public/Granted literature
- US20220170897A1 GAS SAMPLE INTRODUCTION DEVICE, LEAK CHECK METHOD OF GAS SAMPLE INTRODUCTION DEVICE Public/Granted day:2022-06-02
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