Invention Grant
- Patent Title: Fin field-effect transistor (FinFET) static random access memory (SRAM) having pass-gate transistors with offset gate contact regions
-
Application No.: US16712063Application Date: 2019-12-12
-
Publication No.: US11744059B2Publication Date: 2023-08-29
- Inventor: Xia Li , Haining Yang , Bin Yang
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM INCORPORATED
- Current Assignee: QUALCOMM INCORPORATED
- Current Assignee Address: US CA San Diego
- Agency: Patterson + Sheridan, L.L.P.
- Main IPC: H10B10/00
- IPC: H10B10/00 ; H01L29/66 ; G11C11/412 ; H01L29/78 ; H01L27/02

Abstract:
Certain aspects are directed to a static random access memory (SRAM) including an SRAM cell with a pass-gate (PG) transistor having increased threshold voltage to improve the read margin of the SRAM cell. The SRAM generally includes a first SRAM cell having a pull-down (PD) transistor and a PG transistor coupled to the PD transistor. In certain aspects, the SRAM includes a second SRAM cell, the second SRAM cell being adjacent to the first SRAM cell and having a PD transistor and a PG transistor coupled to the PD transistor of the second SRAM cell. The SRAM may also include a gate contact region coupled to a gate region of the PG transistor of the first SRAM cell, wherein at least a portion of the gate contact region is offset from a midpoint between the first SRAM cell and the second SRAM cell.
Public/Granted literature
- US20210183869A1 FIN FIELD-EFFECT TRANSISTOR (FINFET) STATIC RANDOM ACCESS MEMORY (SRAM) Public/Granted day:2021-06-17
Information query