Invention Grant
- Patent Title: Field-effect transistors, devices containing such field-effect transistors and methods of their formation
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Application No.: US17399315Application Date: 2021-08-11
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Publication No.: US11751386B2Publication Date: 2023-09-05
- Inventor: Daniele Vimercati
- Applicant: MICRON TECHNOLOGY, INC.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: G11C16/06
- IPC: G11C16/06 ; H10B41/27 ; G11C5/02 ; H10B43/27

Abstract:
Field-effect transistors, and integrated circuit devices containing such field-effect transistors, might include a semiconductor material having a first conductivity type, a first source/drain region having a second conductivity type, a second source/drain region having the second conductivity type, a first contact connected to the first source/drain region, a conductor overlying an active area of the semiconductor material and having an annular portion surrounding the first contact and a spur portion extending from an outer perimeter of the annular portion of the conductor, a second contact connected to the second source/drain region outside the annular portion of the conductor, a dielectric between the conductor and the active area, and a third contact overlying the active area and connected to the spur portion of the conductor.
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