发明授权
- 专利标题： Materials for forming a nucleation-inhibiting coating and devices incorporating same
-
申请号： US16965585申请日： 2019-01-02
-
公开(公告)号： US11751415B2公开(公告)日： 2023-09-05
- 发明人: Yi-Lu Chang , Qi Wang , Scott Nicholas Genin , Michael Helander , Jacky Qiu , Zhibin Wang , Benoit Lessard
- 申请人： OTI LUMIONICS, INC.
- 申请人地址： CA Toronto
- 专利权人： OTI Lumionics Inc.
- 当前专利权人： OTI Lumionics Inc.
- 当前专利权人地址： CA Mississauga
- 代理机构： Foley & Lardner LLP
- 国际申请： PCT/IB2019/050839 2019.01.02
- 国际公布： WO2019/150327A 2019.08.08
- 进入国家日期： 2020-07-28
- 主分类号： H10K50/824
- IPC分类号： H10K50/824 ; H10K85/00 ; H10K85/60
摘要：
An opto-electronic device includes a substrate, a first electrode disposed over the substrate, a semiconducting layer disposed over the first electrode, a second electrode disposed over the semiconducting layer, the second electrode having a first portion and a second portion, a nucleation inhibition coating disposed over the first portion of the second electrode; and a conductive coating disposed over the second portion of the second electrode, wherein the nucleation inhibition coating is a compound of Formula (I).
公开/授权文献
信息查询
