Invention Grant
- Patent Title: Charged particle beam apparatus and method of controlling charged particle beam apparatus
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Application No.: US17603440Application Date: 2019-04-23
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Publication No.: US11756764B2Publication Date: 2023-09-12
- Inventor: Takashi Dobashi , Hirokazu Tamaki , Kuniyasu Nakamura , Hiromi Mise
- Applicant: HITACHI HIGH-TECH CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Volpe Koenig
- International Application: PCT/JP2019/017173 2019.04.23
- International Announcement: WO2020/217297A 2020.10.29
- Date entered country: 2021-10-13
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/20 ; H01J37/244 ; H01J37/26

Abstract:
A charged particle beam apparatus includes: a movement mechanism; a particle source; an optical element; a detector; and a control mechanism, in which the control mechanism acquires a diffraction pattern including a plurality of Kikuchi lines, calculates a crystal zone axis of the sample by performing analysis based on a plurality of intersections at which two Kikuchi lines included in the diffraction pattern intersect with each other, calculates an inclination angle of the sample based on the crystal zone axis and an irradiation direction of the charged particle beam, and controls the moving mechanism based on the inclination angle.
Public/Granted literature
- US20220216034A1 CHARGED PARTICLE BEAM APPARATUS AND METHOD OF CONTROLLING CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2022-07-07
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