Invention Grant
- Patent Title: Patterned chuck for double-sided processing
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Application No.: US17706319Application Date: 2022-03-28
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Publication No.: US11764099B2Publication Date: 2023-09-19
- Inventor: Ludovic Godet , Rutger Meyer Timmerman Thijssen
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- The original application number of the division: US16183896 2018.11.08
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/683 ; B25B11/00 ; H01L21/687 ; F21V8/00

Abstract:
Embodiments described herein relate to a substrate chucking apparatus having a plurality of cavities formed therein. The cavities are formed in a body of the chucking apparatus and a plurality of support elements extend from the body and separate each of the plurality of cavities. In one embodiment, a first plurality of ports are formed in a top surface of the body and extend to a bottom surface of the body through one or more of the plurality of support elements. In another embodiment, a second plurality of ports are formed in a bottom surface of the plurality of cavities and extend through the body to a bottom surface of the body. In yet another embodiment, a first electrode assembly is disposed adjacent the top surface of the body within each of the plurality of support elements and a second electrode assembly is disposed within the body adjacent each of the plurality of cavities.
Public/Granted literature
- US20220352002A1 PATTERNED CHUCK FOR DOUBLE-SIDED PROCESSING Public/Granted day:2022-11-03
Information query
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