Invention Grant
- Patent Title: Organic thin film transistor and method of manufacturing organic thin film transistor
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Application No.: US17182900Application Date: 2021-02-23
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Publication No.: US11765917B2Publication Date: 2023-09-19
- Inventor: Eijiro Iwase
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP 18157040 2018.08.24
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H10K10/88 ; H10K10/46 ; H10K71/80

Abstract:
Provided are an organic thin film transistor having high bendability and high stability in air and a method of manufacturing the organic thin film transistor. The organic thin film transistor includes: a gas barrier layer consisting of a resin layer and an inorganic layer; a transistor element that is formed on one main surface side of the gas barrier layer and includes a gate electrode, an insulating film, an organic semiconductor layer, a source electrode, and a drain electrode; and a sealing layer that is laminated on a side of the transistor element opposite to the gas barrier layer through an adhesive layer, in which a thickness of the resin layer in the gas barrier layer is less than a thickness ranging from the inorganic layer to the sealing layer in the gas barrier layer.
Public/Granted literature
- US20210175449A1 ORGANIC THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING ORGANIC THIN FILM TRANSISTOR Public/Granted day:2021-06-10
Information query
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