Invention Grant
- Patent Title: Image sensor for immersion lithography
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Application No.: US17600631Application Date: 2020-04-07
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Publication No.: US11774868B2Publication Date: 2023-10-03
- Inventor: Nirupam Banerjee , Johan Franciscus Maria Beckers , Peter Brakhage , Arend Johannes Donkerbroek , Daniel Grimm , Tim Rathje , Martin Tilke , Sandro Wricke
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP 169598 2019.04.16
- International Application: PCT/EP2020/059859 2020.04.07
- International Announcement: WO2020/212196A 2020.10.22
- Date entered country: 2021-10-01
- Main IPC: G03F7/00
- IPC: G03F7/00 ; C23C14/34 ; C23C14/58 ; C23C16/455

Abstract:
An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.
Public/Granted literature
- US20220163896A1 IMAGE SENSOR FOR IMMERSION LITHOGRAPHY Public/Granted day:2022-05-26
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