• Patent Title: Method for removing halogen fluoride, quantitative analysis method for gas component contained in halogen fluoride mixed gas, and quantitative analyzer
  • Application No.: US17416807
    Application Date: 2019-12-09
  • Publication No.: US11779877B2
    Publication Date: 2023-10-10
  • Inventor: Atsushi SuzukiKazuma Matsui
  • Applicant: SHOWA DENKO K.K.
  • Applicant Address: JP Tokyo
  • Assignee: Resonac Corporation
  • Current Assignee: Resonac Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP 18239516 2018.12.21 JP 19194301 2019.10.25
  • International Application: PCT/JP2019/048055 2019.12.09
  • International Announcement: WO2020/129726A 2020.06.25
  • Date entered country: 2021-06-21
  • Main IPC: B01D53/14
  • IPC: B01D53/14 B01D53/30 B01D53/68 B01D53/04
Method for removing halogen fluoride, quantitative analysis method for gas component contained in halogen fluoride mixed gas, and quantitative analyzer
Abstract:
A method for removing a halogen fluoride in a mixed gas by reacting the mixed gas containing a halogen fluoride including bromine or iodine with a removing agent, wherein the removing agent is a chloride, bromide or iodide of potassium, sodium, magnesium, calcium and barium. Also disclosed is a quantitative analysis method as well as a quantitative analyzer for a gas component contained in a hydrogen fluoride mixed gas, the method characterized by reacting a mixed gas containing a halogen fluoride and another gas component with a removing agent, thereby removing the halogen fluoride in the mixed gas, further removing produced by-products, and quantitatively analyzing a residual gas by a gas chromatograph.
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