Invention Grant
- Patent Title: Method for removing halogen fluoride, quantitative analysis method for gas component contained in halogen fluoride mixed gas, and quantitative analyzer
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Application No.: US17416807Application Date: 2019-12-09
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Publication No.: US11779877B2Publication Date: 2023-10-10
- Inventor: Atsushi Suzuki , Kazuma Matsui
- Applicant: SHOWA DENKO K.K.
- Applicant Address: JP Tokyo
- Assignee: Resonac Corporation
- Current Assignee: Resonac Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP 18239516 2018.12.21 JP 19194301 2019.10.25
- International Application: PCT/JP2019/048055 2019.12.09
- International Announcement: WO2020/129726A 2020.06.25
- Date entered country: 2021-06-21
- Main IPC: B01D53/14
- IPC: B01D53/14 ; B01D53/30 ; B01D53/68 ; B01D53/04

Abstract:
A method for removing a halogen fluoride in a mixed gas by reacting the mixed gas containing a halogen fluoride including bromine or iodine with a removing agent, wherein the removing agent is a chloride, bromide or iodide of potassium, sodium, magnesium, calcium and barium. Also disclosed is a quantitative analysis method as well as a quantitative analyzer for a gas component contained in a hydrogen fluoride mixed gas, the method characterized by reacting a mixed gas containing a halogen fluoride and another gas component with a removing agent, thereby removing the halogen fluoride in the mixed gas, further removing produced by-products, and quantitatively analyzing a residual gas by a gas chromatograph.
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