Invention Grant
- Patent Title: Erase method of non-volatile memory device
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Application No.: US17840021Application Date: 2022-06-14
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Publication No.: US11783900B2Publication Date: 2023-10-10
- Inventor: Sang-Won Park , Won Bo Shim , Bong Soon Lim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Lee IP Law, P.C.
- Priority: KR 20190032270 2019.03.21
- Main IPC: G11C16/16
- IPC: G11C16/16 ; G11C16/24 ; G11C16/34 ; G11C16/12

Abstract:
A non-volatile memory device includes a memory cell array including a plurality of cell strings, each of the plurality of cell strings includes a gate-induced drain leakage (GIDL) transistor and a memory cell group, and a control logic to apply a voltage to each of the plurality of cell strings. The control logic performs a first erase operation of erasing the memory cell groups of each of the plurality of cell strings, a first verification operation of detecting erase results of the memory cell groups of each of the plurality of cell strings, and a program operation of programming the GIDL transistors of some of the plurality of cell strings.
Public/Granted literature
- US20220310171A1 ERASE METHOD OF NON-VOLATILE MEMORY DEVICE Public/Granted day:2022-09-29
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