The present disclosure provides an array substrate and a manufacturing method of the array substrate. In the manufacturing method of the array substrate, during performing a first wet etching and a second wet etching on a second metal layer, the wet etching is stopped when a copper conductive layer is merely etched completely. Because a wet etching speed of a liner layer is slow, an etching time of the wet etching and a CD loss of the copper conductive layer can be greatly reduced, and the CD loss is relatively small. Meanwhile, an entire CD loss of the second metal layer can be reduced, and an aperture ratio can be improved.