Invention Grant
- Patent Title: Sealable devices to cause deposition of vapors into samples
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Application No.: US17971018Application Date: 2022-10-21
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Publication No.: US11802091B2Publication Date: 2023-10-31
- Inventor: Inho Cho
- Applicant: The Government of the United States of America, as represented by the Secretary of Homeland Security
- Applicant Address: US DC Washington
- Assignee: The Government of the United States of America, as represented by the Secretary of Homeland Security
- Current Assignee: The Government of the United States of America, as represented by the Secretary of Homeland Security
- Current Assignee Address: US DC Washington
- Agent Lavanya Ratnam; Robert W. Busby; William Washington
- Main IPC: C04B41/45
- IPC: C04B41/45 ; C04B41/00 ; C04B41/62 ; B01J19/00 ; B01J15/00 ; C04B111/54

Abstract:
Various embodiments of the present invention are directed towards a system and method relating to depositing vapor in a sample. For example, a device includes a vapor source chamber configured to contain a vapor source material to generate vapor. An activation chamber is configured to contain a sample. The activation chamber is in fluid communication with the vapor source chamber to receive the vapor. A permeable separator divides the vapor source chamber and the activation chamber, and isolates the sample in the activation chamber while allowing vapor to pass between the vapor source chamber and the activation chamber. The device is sealable and configured to apply vacuum to the vapor and sample, to cause deposition of the vapor into the pumice stone samples.
Public/Granted literature
- US20230039282A1 SEALABLE DEVICES TO CAUSE DEPOSITION OF VAPORS INTO SAMPLES Public/Granted day:2023-02-09
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