Invention Grant
- Patent Title: Bipolar transistor structure with emitter/collector contact to doped semiconductor well and related methods
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Application No.: US17578011Application Date: 2022-01-18
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Publication No.: US11804541B2Publication Date: 2023-10-31
- Inventor: Hong Yu , Vibhor Jain
- Applicant: GlobalFoundries U.S. Inc.
- Applicant Address: US NY Malta
- Assignee: GlobalFoundries U.S. Inc.
- Current Assignee: GlobalFoundries U.S. Inc.
- Current Assignee Address: US NY Malta
- Agency: Hoffman Warnick LLC
- Agent Francois Pagette
- Main IPC: H01L29/735
- IPC: H01L29/735 ; H01L29/08 ; H01L29/66 ; H01L29/417

Abstract:
Embodiments of the disclosure provide a lateral bipolar transistor structure with an emitter/collector (E/C) contact to a doped semiconductor well and related methods. A bipolar transistor structure according to the disclosure may include a doped semiconductor well over a semiconductor substrate. An insulative region is on the doped semiconductor well. A base layer is on the insulative region, and an emitter/collector (E/C) layer on the insulative region and adjacent a first sidewall of the base layer. An E/C contact to the doped semiconductor well includes a lower portion adjacent the insulative region and an upper portion adjacent and electrically coupled to the E/C layer.
Public/Granted literature
Information query
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